Dong Niu, Ph.D.
Affiliations: | North Carolina State University, Raleigh, NC |
Area:
NanotechnologyGoogle:
"Dong Niu"Mean distance: 11.2 | S | N | B | C | P |
Parents
Sign in to add mentor| Gregory N. Parsons | grad student | 2002 | NCSU | |
| (Interface reactions during processing of chemical vapor deposited yttrium oxide high -k dielectrics.) | ||||
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Publications
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| Lyu L, Niu D, Xie H, et al. (2016) Orientation-dependent energy level alignment and film growth of 2,7-diocty[1]benzothieno[3,2-b]benzothiophene (C8-BTBT) on HOPG. The Journal of Chemical Physics. 144: 034701 |
| Xie H, Liu X, Lyu L, et al. (2016) Effects of Precursor Ratios and Annealing on Electronic Structure and Surface Composition of CH3NH3PbI3 Perovskite Films Journal of Physical Chemistry C. 120: 215-220 |
| Niu D, Wang Q, Zhang C, et al. (2016) Preparation, characterization and application of high-temperature Al2O3 insulating film Surface and Coatings Technology. 291: 318-324 |
| Tang J, Niu D, Yang Y, et al. (2016) Preparation of ScAlN films as a function of sputtering atmosphere Journal of Materials Science: Materials in Electronics. 1-6 |
| Shang Y, Wang L, Niu D, et al. (2016) Effects of additive for anodizing electrolyte on anodic film of high silicon aluminum alloy International Journal of Electrochemical Science. 11: 1549-1557 |
| Zhang L, Yang Y, Huang H, et al. (2015) Thickness-dependent air-exposure-induced phase transition of CuPc ultrathin films to well-ordered one-dimensional nanocrystals on layered substrates Journal of Physical Chemistry C. 119: 4217-4223 |
| Liu X, Chen J, Luo M, et al. (2014) Thermal evaporation and characterization of Sb2Se3 thin film for substrate Sb2Se3/CdS solar cells. Acs Applied Materials & Interfaces. 6: 10687-95 |
| Niu D, Ashcraft RW, Hinkle C, et al. (2004) Effect of N 2 plasma on yttrium oxide and yttrium-oxynitride dielectrics Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 445-451 |
| Niu D, Ashcraft RW, Chen Z, et al. (2003) Chemical, physical, and electrical characterizations of oxygen plasma assisted chemical vapor deposited yttrium oxide on silicon Journal of the Electrochemical Society. 150: F102-F109 |
| Ulrich MD, Rowe JE, Niu D, et al. (2003) Bonding and structure of ultrathin yttrium oxide films for Si field effect transistor gate dielectric applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 1792-1796 |