David B. Terry, Ph.D.

Nanotechnology

Gregory N. Parsons	grad student	2006	NCSU
(A holistic investigation of alternative gate stack materials for future CMOS applications.)

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Park KJ, Terry DB, Stewart SM, et al. (2007) In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 6106-12
Park KJ, Terry DB, Stewart SM, et al. (2007) In situ auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces Langmuir. 23: 6106-6112
Gougousi T, Terry DB, Parsons GN. (2006) Charge generation during oxidation of thin Hf metal films on silicon Thin Solid Films. 513: 201-205
Gougousi T, Jason Kelly M, Terry DB, et al. (2003) Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon Journal of Applied Physics. 93: 1691-1696