Tianyue Yu, Ph.D.
Affiliations: | 2003 | Cornell University, Ithaca, NY, United States |
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"Tianyue Yu"Mean distance: 11.78 | S | N | B | C | P |
Parents
Sign in to add mentor| Christopher K. Ober | grad student | 2003 | Cornell | |
| (The fabrication and functionalization of hydrogels into two-dimensional and three-dimensional assemblies and their applications in nanobiotechnology.) | ||||
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Publications
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| Yu T, Wang Q, Johnson DS, et al. (2005) Functional Hydrogel Surfaces: Binding Kinesin-Based Molecular Motor Proteins to Selected Patterned Sites Advanced Functional Materials. 15: 1303-1309 |
| Kuebler SM, Perry JW, Marder SR, et al. (2004) High-sensitivity material systems for two-photon three-dimensional microfabrication Proceedings of Spie - the International Society For Optical Engineering. 5347: 111-117 |
| Yu T, Ober CK. (2003) Methods for the topographical patterning and patterned surface modification of hydrogels based on hydroxyethyl methacrylate. Biomacromolecules. 4: 1126-31 |
| Kuebler SM, Braun KL, Zhou W, et al. (2003) Design and application of high sensitivity two-photon initiators for three-dimensional microfabrication Journal of Photochemistry and Photobiology a: Chemistry. 158: 163-170 |
| Chiellini F, Bizzarri R, Ober CK, et al. (2003) Surface patterning and biological evaluation of semi-interpenetrated poly(HEMA)/poly(alkyl β-malolactonate)s Macromolecular Symposia. 197: 369-379 |
| Yu T, Ober CK, Kuebler SM, et al. (2003) Chemically amplified positive resists for two-photon three-dimensional microfabrication Advanced Materials. 15: 517-521 |
| Zhou W, Kuebler SM, Braun KL, et al. (2002) An efficient two-photon-generated photoacid applied to positive-tone 3D microfabrication. Science (New York, N.Y.). 296: 1106-9 |
| Kuebler SM, Braun KL, Zhou W, et al. (2002) High-sensitivity two-photon photoacid generator for three-dimensional microfabrication Proceedings of Spie - the International Society For Optical Engineering. 4809: 170-178 |
| Bae YC, Douki K, Yu T, et al. (2002) Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones Chemistry of Materials. 14: 1306-1313 |
| Bae YC, Douki K, Yu T, et al. (2001) Rejuvenation of 248nm Resist Backbones for 157nm Lithography. Journal of Photopolymer Science and Technology. 14: 613-620 |