Junyan Dai, Ph.D.
Affiliations: | 2004 | Cornell University, Ithaca, NY, United States |
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"Junyan Dai"Mean distance: 11.78
Parents
Sign in to add mentor| Christopher K. Ober | grad student | 2004 | Cornell | |
| (Novel resists for advanced lithography.) | ||||
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Publications
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| Zhang B, Liu W, Meng L, et al. (2019) Study of the perpendicular self-assembly of a novel high- block copolymer without any neutral layer on a silicon substrate. Rsc Advances. 9: 3828-3837 |
| Ablikim M, Achasov MN, Ahmed S, et al. (2016) Observation of an Anomalous Line Shape of the η^{'}π^{+}π^{-} Mass Spectrum near the pp[over ¯] Mass Threshold in J/ψ→γη^{'}π^{+}π^{-}. Physical Review Letters. 117: 042002 |
| Ablikim M, Achasov MN, Ai XC, et al. (2016) Observation of h_{c} Radiative Decay h_{c}→γη^{'} and Evidence for h_{c}→γη. Physical Review Letters. 116: 251802 |
| Dai J, Chang SW, Hamad A, et al. (2006) Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411 |
| Bratton D, Yang D, Dai J, et al. (2006) Recent progress in high resolution lithography Polymers For Advanced Technologies. 17: 94-103 |
| Bae YC, Douki K, Yu T, et al. (2002) Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones Chemistry of Materials. 14: 1306-1313 |
| Bae YC, Douki K, Yu T, et al. (2001) Rejuvenation of 248nm Resist Backbones for 157nm Lithography. Journal of Photopolymer Science and Technology. 14: 613-620 |
| Schmaljohann D, Young CB, Dai J, et al. (2000) Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458 |