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Joan K. Bosworth, Ph.D.

Affiliations: 
2009 Cornell University, Ithaca, NY, United States 
Area:
polymers
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"Joan Bosworth"
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Christopher K. Ober grad student 2009 Cornell
 (Solvent vapor assisted self assembly of patternable block copolymers.)

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Tada Y, Yoshida H, Ishida Y, et al. (2012) Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor Macromolecules. 45: 292-304
Bosworth JK, Ober CK. (2012) Top-Down versus Bottom-Up Patterning of Polymers Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 9-35
Rose F, Bosworth JK, Dobisz EA, et al. (2011) Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes. Nanotechnology. 22: 035603
Bosworth JK, Dobisz EA, Hellwig O, et al. (2011) Impact of out-of-plane translational order in block copolymer lithography Macromolecules. 44: 9196-9204
Paik MY, Bosworth JK, Smilges DM, et al. (2010) Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. Macromolecules. 43: 4253-4260
Bosworth JK, Dobisz E, Ruiz R. (2010) 20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media Journal of Photopolymer Science and Technology. 23: 145-148
Schwartz EL, Bosworth JK, Paik MY, et al. (2010) New self-assembly strategies for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7639
Hellwig O, Bosworth JK, Dobisz E, et al. (2010) Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution Applied Physics Letters. 96
Bosworth JK, Black CT, Ober CK. (2009) Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer. Acs Nano. 3: 1761-6
Bosworth JK, Paik MY, Ruiz R, et al. (2008) Control of self-assembly of lithographically patternable block copolymer films. Acs Nano. 2: 1396-402
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