Alan J. Telecky, Ph.D.
Affiliations: | 2012 | Oregon State University, Corvallis, OR |
Area:
materials chemistryGoogle:
"Alan Telecky"Mean distance: 8.69
Parents
Sign in to add mentor| Doug Keszler | grad student | 2012 | Oregon State | |
| (Photoresist and Ion-Exchange Chemistry of HafSOx.) | ||||
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Publications
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| Stowers J, Anderson J, Cardineau B, et al. (2016) Metal oxide EUV photoresist performance for N7 relevant patterns and processes Proceedings of Spie - the International Society For Optical Engineering. 9779 |
| Grenville A, Anderson JT, Clark BL, et al. (2015) Integrated fab process for metal oxide EUV photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425 |
| Flynn B, Kim D, Clark BL, et al. (2014) In-situ characterization of aqueous-based hafnium oxide hydroxide sulfate thin films Surface and Interface Analysis. 46: 210-215 |
| Stowers JK, Telecky A, Kocsis M, et al. (2011) Directly patterned inorganic hardmask for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 7969 |
| Telecky A, Xie P, Stowers J, et al. (2010) Photopatternable inorganic hardmask Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6S19-C6S22 |