Andrew T. Jamieson, Ph.D.
Affiliations: | 2004 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
design and synthesis of functional organic materialsGoogle:
"Andrew Jamieson"Mean distance: 8.45 | S | N | B | C | P |
Parents
Sign in to add mentor| C. Grant Willson | grad student | 2004 | UT Austin | |
| (Top surface imaging for sub-100nm lithography.) | ||||
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Publications
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| Pawloski AR, Acheta A, Levinson HJ, et al. (2006) Line edge roughness and intrinsic bias for two methacrylate polymer resist systems Journal of Microlithography, Microfabrication and Microsystems. 5 |
| Meiring JE, Michaelson TB, Jamieson AT, et al. (2005) Using mesoscale simulation to explore photoresist line edge roughness Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 350-360 |
| Jamieson A, Willson CG, Hsu Y, et al. (2004) Low-voltage electron beam lithography resist processes: Top surface imaging and hydrogen silisesquioxane bilayer Journal of Microlithography, Microfabrication and Microsystems. 3: 442-449 |
| Johnson SC, Bailey TC, Dickey MD, et al. (2003) Advances in step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 197-202 |
| Johnson HF, Ozair SN, Jamieson A, et al. (2003) Cationic graft polymerization lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 943-951 |
| Jamieson A, Somervell M, Hoang Vi Tran, et al. (2001) Top surface imaging at 157 nm Proceedings of Spie - the International Society For Optical Engineering. 4345: 406-416 |
| Brodsky C, Byers J, Conley W, et al. (2000) 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401 |