Maheswaran Surendra
Affiliations: | 1986-1991 | Chemical and Biomolecular Engineering | University of California, Berkeley, Berkeley, CA, United States |
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Publications
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Surendra M. (1995) Radiofrequency discharge benchmark model comparison Plasma Sources Science and Technology. 4: 56-73 |
Surendra M, Guarnieri CR, Selwyn GS, et al. (1995) Across wafer etch rate uniformity in a high density plasma reactor: Experiment and modeling Applied Physics Letters. 2415 |
Vahedi V, Surendra M. (1995) A Monte Carlo collision model for the particle-in-cell method: applications to argon and oxygen discharges Computer Physics Communications. 87: 179-198 |
Joubert O, Oehrlein GS, Surendra M, et al. (1994) Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 12: 1957-1961 |
Joubert O, Oehrlein GS, Surendra M. (1994) Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 12: 665-670 |
Dalvie M, Surendra M, Selwyn GS, et al. (1994) Detection and modelling of electrode topography effects on particle traps Plasma Sources Science and Technology. 3: 442-447 |
Surendra M, Vender D. (1994) Collisionless electron heating by radio-frequency plasma sheaths Applied Physics Letters. 65: 153-155 |
Surendra M. (1994) Study of capacitive rf discharge characteristics through particle simulations Ieee International Conference On Plasma Science. 136 |
Surendra M, Dalvie M. (1993) Moment analysis of rf parallel-plate-discharge simulations using the particle-in-cell with Monte Carlo collisions technique. Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 48: 3914-3924 |
Dalvie M, Selwyn GS, Surendra M, et al. (1993) Detection of particle traps by spatially resolved optical emission spectroscopy over grooved electrodes in radio frequency discharges Applied Physics Letters. 63: 3279-3281 |