John Daugherty
Affiliations: | 1989-1994 | Chemical and Biomolecular Engineering | University of California, Berkeley, Berkeley, CA, United States |
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| Ullal SJ, Singh H, Daugherty J, et al. (2002) Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 1939-1946 |
| Ullal SJ, Singh H, Daugherty J, et al. (2002) Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1195-1201 |
| Daugherty JE, Graves DB. (1995) Derivation and experimental verification of a particulate transport model for a glow discharge Journal of Applied Physics. 78: 2279-2287 |
| Daugherty JE, Graves DB. (1993) Particulate Temperature in Radio Frequency Glow Discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 1126-1131 |