Lakmal C. Kalutarage, Ph.D.
Affiliations: | 2014 | Chemistry | Wayne State University, Detroit, MI, United States |
Area:
Inorganic Chemistry, NanoscienceGoogle:
"Lakmal Kalutarage"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Charles H. Winter | grad student | 2014 | Wayne State | |
| (Precursors and processes for the growth of metallic first row transition metal films by atomic layer deposition.) | ||||
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Publications
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| Kalutarage LC, Clendenning SB, Winter CH. (2014) Manganese precursor selection and the thermal atomic layer deposition of copper/manganese alloy films Ecs Transactions. 64: 147-157 |
| Kalutarage LC, Clendenning SB, Winter CH. (2014) Low-temperature atomic layer deposition of copper films using borane dimethylamine as the reducing co-reagent Chemistry of Materials. 26: 3731-3738 |
| Kalutarage LC, Martin PD, Heeg MJ, et al. (2013) Volatile and thermally stable mid to late transition metal complexes containing α-imino alkoxide ligands, a new strongly reducing coreagent, and thermal atomic layer deposition of Ni, Co, Fe, and Cr metal films. Journal of the American Chemical Society. 135: 12588-91 |
| Kalutarage LC, Martin PD, Heeg MJ, et al. (2013) Synthesis, structure, and solution reduction reactions of volatile and thermally stable mid to late first row transition metal complexes containing hydrazonate ligands. Inorganic Chemistry. 52: 5385-94 |
| Kalutarage LC, Heeg MJ, Martin PD, et al. (2013) Volatility and high thermal stability in mid-to-late first-row transition-metal complexes containing 1,2,5-triazapentadienyl ligands. Inorganic Chemistry. 52: 1182-4 |
| Knisley TJ, Kalutarage LC, Winter CH. (2013) Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films Coordination Chemistry Reviews. 257: 3222-3231 |