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Joseph L. Cecchi

Affiliations: 
University of New Mexico, Albuquerque, NM, United States 
Area:
Chemical Engineering, Physical Chemistry
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Todd M. Bauer grad student 2001 Univ. of New Mexico
Xiaomei Wu grad student 2003 Univ. of New Mexico

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Jiang YB, Xomeritakis G, Chen Z, et al. (2007) Sub-10 nm thick microporous membranes made by plasma-defined atomic layer deposition of a bridged silsesquioxane precursor. Journal of the American Chemical Society. 129: 15446-7
Jiang YB, Liu N, Gerung H, et al. (2006) Nanometer-thick conformal pore sealing of self-assembled mesoporous silica by plasma-assisted atomic layer deposition. Journal of the American Chemical Society. 128: 11018-9
Littau ME, Sowa MJ, Cecchi JL. (2002) Diode laser measurements of CFx species in a low-pressure, high-density plasma reactor Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1603-1610
Sowa MJ, Littau ME, Pohray V, et al. (2000) Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2122-2129
Stevens JE, Sowa MJ, Cecchi JL. (1996) Uniformity of radio frequency bias voltages along conducting surfaces in a plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 14: 139-143
Sowa MJ, Stevens JE, Cecchi JL. (1995) Helicon plasma source excited by a flat spiral coil Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 2476-2482
Bannister ME, Cecchi JL. (1994) Metastable argon beam source using a surface wave sustained plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 12: 106-113
Stevens JE, Cecchi JL. (1993) Wave propagation and plasma uniformity in an electron cyclotron resonance plasma etch reactor Japanese Journal of Applied Physics. 32: 3007-3012
Stevens JE, Huang YC, Jarecki RL, et al. (1992) Plasma uniformity and power deposition in electron cyclotron resonance etch tools Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 1270-1275
Cecchi JL, Stevens JE, Jarecki RL, et al. (1991) Operational characteristics of SFs etching in an electron cyclotron resonance plasma reactor Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 9: 318-324
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