Michael D. Stewart

Affiliations: 
2003 University of Texas at Austin, Austin, Texas, U.S.A. 
Google:
"Michael Stewart"
Mean distance: (not calculated yet)
 

Parents

Sign in to add mentor
C. Grant Willson grad student 2003 UT Austin
 (Catalyst diffusion in positive -tone chemically amplified photoresists.)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Schmid GM, Stewart MD, Wetzel J, et al. (2006) Implementation of an imprint damascene process for interconnect fabrication Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1283-1291
Dickey DA, Dickey MD, Stewart MD, et al. (2006) An Automated Statistical Process Control Study of Inline Mixing Using Spectrophotometric Detection Journal of Chemical Education. 83: 110-113
Gates BD, Xu Q, Stewart M, et al. (2005) New approaches to nanofabrication: molding, printing, and other techniques. Chemical Reviews. 105: 1171-96
Nishimura Y, Michaelson TB, Meiring JE, et al. (2005) Line edge roughness in chemically amplified resist: Speculation, simulation and application Journal of Photopolymer Science and Technology. 18: 457-465
Stewart MD, Willson CG. (2005) Imprint Materials for Nanoscale Devices Mrs Bulletin. 30: 947-951
Stewart MD, Johnson SC, Sreenivasan SV, et al. (2005) Nanofabrication with step and flash imprint lithography Journal of Micro-Nanolithography Mems and Moems. 4: 11002
Kim EK, Stewart MD, Wu K, et al. (2005) Vinyl ether formulations for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2967-2971
Tsiartas PC, Schmid GM, Johnson HF, et al. (2005) Quantifying acid generation efficiency for photoresist applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 224-228
Schmid GM, Stewart MD, Burns SD, et al. (2004) Mesoscale Monte Carlo Simulation of Photoresist Processing Journal of the Electrochemical Society. 151: G155-G161
Jones RL, Hu T, Lin EK, et al. (2004) Formation of deprotected fuzzy blobs in chemically amplified resists Journal of Polymer Science, Part B: Polymer Physics. 42: 3063-3069
See more...