Zachary A. Sechrist, Ph.D.
Affiliations: | 2006 | University of Colorado, Boulder, Boulder, CO, United States |
Area:
Physical ChemistryGoogle:
"Zachary Sechrist"Mean distance: (not calculated yet)
Parents
Sign in to add mentorSteven McClellan George | grad student | 2006 | CU Boulder | |
(One-dimensional and three-dimensional photonic crystals created using atomic layer deposition.) |
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Publications
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Wind RW, Fabreguette FH, Sechrist ZA, et al. (2009) Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3 Journal of Applied Physics. 105: 074309 |
Sechrist ZA, Piestun R, George SM. (2008) Atomic layer deposition of tungsten thin films on opals in the visible region Aip Conference Proceedings. 992: 507-512 |
Sechrist ZA, Schwartz BT, Lee JH, et al. (2006) Modification of opal photonic crystals using Al 2O 3 atomic layer deposition Chemistry of Materials. 18: 3562-3570 |
Sechrist ZA, Schwartz BT, Lee JH, et al. (2006) Selective modification of opal photonic crystals using atomic layer deposition Optics Infobase Conference Papers |
Sechrist ZA, Fabreguette FH, Heintz O, et al. (2005) Optimization and structural characterization of W/Al 2O 3 nanolaminates grown using atomic layer deposition techniques Chemistry of Materials. 17: 3475-3485 |
Fabreguette F, Sechrist Z, Elam J, et al. (2005) Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6 Thin Solid Films. 488: 103-110 |
Costescu RM, Cahill DG, Fabreguette FH, et al. (2004) Ultra-low thermal conductivity in W/Al2O3 nanolaminates. Science (New York, N.Y.). 303: 989-90 |
Elam JW, Wilson CA, Schuisky M, et al. (2003) Improved nucleation of TiN atomic layer deposition films on SiLK low-k polymer dielectric using an Al[sub 2]O[sub 3] atomic layer deposition adhesion layer Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 1099 |
Elam J, Sechrist Z, George S. (2002) ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements Thin Solid Films. 414: 43-55 |