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Tang Y, Liu J, Yang Y, et al. (2019) Large range nano alignment for proximity lithography using complex grating Optics and Laser Technology. 112: 101-106
Zhou Y, Tang Y, Zhu J, et al. (2017) Characterization of micro structure through hybrid interference and phase determination in broadband light interferometry. Applied Optics. 56: 2301-2306
Zhou Y, Tang Y, Deng Q, et al. (2017) Contrast enhancement of microsphere-assisted super-resolution imaging in dark-field microscopy Applied Physics Express. 10: 82501
Zhou Y, Tang Y, Deng Q, et al. (2017) Dimensional metrology of smooth micro structures utilizing the spatial modulation of white-light interference fringes Optics and Laser Technology. 93: 187-193
Cheng Y, Zhu J, He Y, et al. (2017) Quadratic grating apodized photon sieves for simultaneous multiplane microscopy Optics and Lasers in Engineering. 97: 78-85
Zhu X, Hu S, Zhao L. (2015) Wafer focusing measurement of optical lithography system based on Hartmann–Shack wavefront testing Optics and Lasers in Engineering. 66: 128-131
Zhu X, Hu S, Zhao L. (2014) Focal length measurement of a microlens-array by grating shearing interferometry. Applied Optics. 53: 6663-9
He Y, Zhao L, Tang Y, et al. (2014) A hybrid doubled achromat based on a photon sieve Optik. 125: 958-961
Zhu J, Hu S, Yu J, et al. (2013) Four-quadrant gratings moiré fringe alignment measurement in proximity lithography. Optics Express. 21: 3463-73
Zhou S, Yang Y, Zhao L, et al. (2010) Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography. Optics Letters. 35: 3132-4
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