Kannan Seshadri, Ph.D.

Affiliations: 
1992-1998 Chemistry Pennsylvania State University, State College, PA, United States 
Area:
Chemistry, Materials Science
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"Kannan Seshadri"
Bio:

Research and Product Development, 3M Company 2000-present
www.linkedin.com/in/kannan-seshadri

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Cross-listing: Materials Tree

Parents

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David L. Allara grad student 1993-1998 Penn State
C. Daniel Frisbie post-doc 1999-2000 UMN
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Publications

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Seshadri K, Frisbie CD. (2001) Potentiometry of an operating organic semiconductor field-effect transistor Applied Physics Letters. 78: 993-995
Öberg K, Edlund U, Eliasson B, et al. (2000) Spectroscopic characterization of the bonding, orientation, and coverage of copper tetraazaphthalocyanine monolayer films on SiO2 surfaces. Journal of Physical Chemistry B. 104: 10627-10634
Seshadri K, Wilson AM, Guiseppi-Elie A, et al. (1999) Toward Controlled Area Electrode Assemblies: Selective Blocking of Gold Electrode Defects with Polymethylene Nanocrystals Langmuir. 15: 742-748
Carr DW, Lercel MJ, Whelan CS, et al. (1997) High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists. Journal of Vacuum Science and Technology A. 15: 1446-50
Carr DW, Lercel MJ, Whelan CS, et al. (1997) High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 1446-1450
Seshadri K, Atre SV, Tao YT, et al. (1997) Synthesis of crystalline, nanometer-scale, -(CH2)(x)- clusters and films on gold surfaces Journal of the American Chemical Society. 119: 4698-4711
Parikh AN, Schivley MA, Koo E, et al. (1997) n-Alkylsiloxanes: From single monolayers to layered crystals. The formation of crystalline polymers from the hydrolysis of n-octadecyltrichlorosilane Journal of the American Chemical Society. 119: 3135-3143
Lercel MJ, Whelan CS, Craighead HG, et al. (1996) High- resolution silicon patterning with self-assembled monolayer resists. Journal of Vacuum Science and Technology B. 14: 4085
Lercel MJ, Craighead HG, Parikh AN, et al. (1996) Plasma etching with self-assembled monolayer masks for nanostructure fabrication. Journal of Vacuum Science and Technology A. 14: 1844-9
Whelan CS, Lercel MJ, Craighead HG, et al. (1996) Improved electron-beam patterning of Si with self-assembled monolayers. Applied Physics Letters. 69: 4245-7
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