Kannan Seshadri, Ph.D.
Affiliations: | 1992-1998 | Chemistry | Pennsylvania State University, State College, PA, United States |
Area:
Chemistry, Materials ScienceGoogle:
"Kannan Seshadri"Bio:
Research and Product Development, 3M Company 2000-present
www.linkedin.com/in/kannan-seshadri
Mean distance: (not calculated yet)
Cross-listing: Materials Tree
Parents
Sign in to add mentorDavid L. Allara | grad student | 1993-1998 | Penn State |
C. Daniel Frisbie | post-doc | 1999-2000 | UMN |
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Publications
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Seshadri K, Frisbie CD. (2001) Potentiometry of an operating organic semiconductor field-effect transistor Applied Physics Letters. 78: 993-995 |
Öberg K, Edlund U, Eliasson B, et al. (2000) Spectroscopic characterization of the bonding, orientation, and coverage of copper tetraazaphthalocyanine monolayer films on SiO2 surfaces. Journal of Physical Chemistry B. 104: 10627-10634 |
Seshadri K, Wilson AM, Guiseppi-Elie A, et al. (1999) Toward Controlled Area Electrode Assemblies: Selective Blocking of Gold Electrode Defects with Polymethylene Nanocrystals Langmuir. 15: 742-748 |
Carr DW, Lercel MJ, Whelan CS, et al. (1997) High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists. Journal of Vacuum Science and Technology A. 15: 1446-50 |
Carr DW, Lercel MJ, Whelan CS, et al. (1997) High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 1446-1450 |
Seshadri K, Atre SV, Tao YT, et al. (1997) Synthesis of crystalline, nanometer-scale, -(CH2)(x)- clusters and films on gold surfaces Journal of the American Chemical Society. 119: 4698-4711 |
Parikh AN, Schivley MA, Koo E, et al. (1997) n-Alkylsiloxanes: From single monolayers to layered crystals. The formation of crystalline polymers from the hydrolysis of n-octadecyltrichlorosilane Journal of the American Chemical Society. 119: 3135-3143 |
Lercel MJ, Whelan CS, Craighead HG, et al. (1996) High- resolution silicon patterning with self-assembled monolayer resists. Journal of Vacuum Science and Technology B. 14: 4085 |
Lercel MJ, Craighead HG, Parikh AN, et al. (1996) Plasma etching with self-assembled monolayer masks for nanostructure fabrication. Journal of Vacuum Science and Technology A. 14: 1844-9 |
Whelan CS, Lercel MJ, Craighead HG, et al. (1996) Improved electron-beam patterning of Si with self-assembled monolayers. Applied Physics Letters. 69: 4245-7 |