Ulrich Gösele, Ph.D.

Affiliations: 
Max Planck Institute of Microstructure Physics 
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"Ulrich Gösele"
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Publications

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Reiche M, Moutanabbir O, Hoentschel J, et al. (2011) Strained Silicon Nanodevices Mechanical Stress On the Nanoscale: Simulation, Material Systems and Characterization Techniques. 131-150
Lee J, Berger A, Cagnon L, et al. (2010) Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process. Physical Chemistry Chemical Physics : Pccp. 12: 15247-50
Yang RB, Zakharov N, Moutanabbir O, et al. (2010) The transition between conformal atomic layer epitaxy and nanowire growth. Journal of the American Chemical Society. 132: 7592-4
Qin Y, Kim Y, Zhang L, et al. (2010) Preparation and elastic properties of helical nanotubes obtained by atomic layer deposition with carbon nanocoils as templates Small. 6: 910-914
Moutanabbir O, Reiche M, Hähnel A, et al. (2010) Nanoscale patterning induced strain redistribution in ultrathin strained Si layers on oxide. Nanotechnology. 21: 134013
Moutanabbir O, Gösele U. (2010) Heterogeneous integration of compound semiconductors Annual Review of Materials Research. 40: 469-500
Moutanabbir O, Scholz R, Gösele U, et al. (2010) Experimental elucidation of vacancy complexes associated with hydrogen ion-induced splitting of bulk GaN Physical Review B - Condensed Matter and Materials Physics. 81
Moutanabbir O, Reiche M, Hähnel A, et al. (2010) Nanoscale patterning induced strain redistribution in ultrathin strained Si layers on oxide Nanotechnology. 21
Lee J, Berger A, Cagnon L, et al. (2010) Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process Physical Chemistry Chemical Physics. 12: 15247-15250
Yang RB, Zakharov N, Moutanabbir O, et al. (2010) The transition between conformal atomic layer epitaxy and nanowire growth Journal of the American Chemical Society. 132: 7592-7594
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