Jeffrey W. Elam
Affiliations: | Argonne National Laboratory, Lemont, IL, United States |
Website:
http://www.anl.gov/contributors/jeffrey-elamGoogle:
"Jeffrey W. Elam"Bio:
https://www.anl.gov/profile/jeffrey-w-elam
DOI: 10.1063/1.474071
Mean distance: 8.75 | S | N | B | C | P |
Parents
Sign in to add mentor| Donald H. Levy | grad student | 1995 | Chicago | |
| (Laser desorption of organic compounds : an experimental study of mechanism) | ||||
| Steven McClellan George | post-doc | CU Boulder | ||
Children
Sign in to add trainee| Jian Liu | post-doc | 2016- | Argonne National Laboratory |
| Yu Lei | post-doc | 2010-2013 | Argonne National Laboratory |
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Publications
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| Soares J, Mane AU, Choudhury D, et al. (2023) Thermal Atomic Layer Etching of MoS Using MoF and HO. Chemistry of Materials : a Publication of the American Chemical Society. 35: 927-936 |
| Das A, Jones LO, Chen Y, et al. (2022) Atomic-Scale View of Redox Induced Changes for Monolayer MoO on α-TiO(110) with Chemical-State Sensitivity. The Journal of Physical Chemistry Letters. 5304-5309 |
| Sønsteby HH, Killi VAK, Storaas TA, et al. (2020) Understanding KOBu in atomic layer deposition - mechanistic studies of the KNbO growth process. Dalton Transactions (Cambridge, England : 2003) |
| Young MJ, Yanguas-Gil A, Letourneau S, et al. (2020) Probing the atomic-scale structure of amorphous aluminum oxide grown by atomic layer deposition. Acs Applied Materials & Interfaces |
| Jang MH, Kizilkaya O, Kropf AJ, et al. (2020) Synergetic effect on catalytic activity and charge transfer in Pt-Pd bimetallic model catalysts prepared by atomic layer deposition. The Journal of Chemical Physics. 152: 024710 |
| Coile MW, Young MJ, Libera JA, et al. (2020) High-capacity rotary drum for atomic layer deposition onto powders and small mechanical parts in a hot-walled viscous flow reactor Journal of Vacuum Science and Technology. 38: 52403 |
| Parsons GN, Elam JW, George SM, et al. (2020) Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)] Journal of Vacuum Science & Technology A. 38: 037001 |
| Choudhury D, Mandia DJ, Langeslay RR, et al. (2020) Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water Journal of Vacuum Science and Technology. 38: 42407 |
| Sønsteby HH, Yanguas-Gil A, Elam JW. (2020) Consistency and reproducibility in atomic layer deposition Journal of Vacuum Science and Technology. 38: 20804 |
| Sønsteby HH, Skaar E, Bratvold JE, et al. (2020) Tuning Electronic Properties in LaNiO3 Thin Films by B-site Cu-substitution Journal of Materials Chemistry C |