Parents
Sign in to add mentor| Stephen P. Boyd | grad student | 2003 | Stanford | |
| (Design of feedforward and feedback controllers by signal processing and convex optimization techniques.) | ||||
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Publications
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| Yang Y, Lee H, Liu C, et al. (2014) Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Proceedings of Spie. 9050: 905032 |
| Chen CY, Ng PCW, Liu CH, et al. (2013) Direct-scatterometry-enabled optical-proximity-correction-model calibration Proceedings of Spie - the International Society For Optical Engineering. 8681 |
| Liu C, Ng PCW, Shen Y, et al. (2013) Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31: 21605 |
| Ng PCW, Tsai K, Melvin LS. (2013) Study of etching bias modeling and correction strategies for compensation of patterning process effects Microelectronic Engineering. 110: 147-151 |
| Shen YT, Liu CH, Chen CY, et al. (2012) Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples Proceedings of Spie - the International Society For Optical Engineering. 8324 |
| Chen CY, Tsai KY, Shen YT, et al. (2012) Direct-scatterometry-enabled lithography model calibration Proceedings of Spie - the International Society For Optical Engineering. 8324 |
| Ng H, Shen Y, Chen S, et al. (2012) New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Journal of Micro-Nanolithography Mems and Moems. 11 |
| Liu C, Ng H, Tsai K. (2012) New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography Journal of Micro-Nanolithography Mems and Moems. 11: 13009 |
| Ng PCW, Tsai K, Melvin LS. (2011) Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects Journal of Micro-Nanolithography Mems and Moems. 10: 33010 |
| Ng PCW, Tsai K, Lee Y, et al. (2011) Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects Journal of Micro-Nanolithography Mems and Moems. 10: 13004 |