Lei Yuan, Ph.D.
Affiliations: | 2005 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesGoogle:
"Lei Yuan"Parents
Sign in to add mentor| Andrew R. Neureuther | grad student | 2005 | UC Berkeley | |
| (Modeling and calibration of resist processes in photolithography.) | ||||
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Publications
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| Neureuther AR, Pease RFW, Yuan L, et al. (2006) Shot noise models for sequential processes and the role of lateral mixing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1902-1908 |
| Cheng M, Yuan L, Croffie E, et al. (2002) Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 734-740 |
| Cheng M, Croffie E, Yuan L, et al. (2000) Enhancement of resist resolution and sensitivity via applied electric field Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3318-3322 |
| Croffie E, Yuan L, Cheng M, et al. (2000) Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3340-3344 |