Chris H. Clifford, Ph.D.
Affiliations: | 2010 | Electrical Engineering & Computer Sciences | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesGoogle:
"Chris Clifford"Parents
Sign in to add mentor| Andrew R. Neureuther | grad student | 2010 | UC Berkeley | |
| (Simulation and compensation methods for EUV lithography masks with buried defects.) | ||||
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Publications
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| Lam M, Clifford C, Raghunathan A, et al. (2017) Enabling full field physics based OPC via dynamic model generation Proceedings of Spie. 10143: 1014316 |
| Chen A, Foong YM, Thaler T, et al. (2017) Effective use of aerial image metrology for calibration of OPC models Proceedings of Spie. 10147 |
| Clifford C, Lam M, Raghunathan A, et al. (2017) Optical proximity correction for anamorphic extreme ultraviolet lithography Journal of Micro-Nanolithography Mems and Moems. 16: 41004 |
| Lam M, Clifford C, Raghunathan A, et al. (2017) Enabling full-field physics-based optical proximity correction via dynamic model generation Journal of Micro-Nanolithography Mems and Moems. 16: 33502-33502 |
| Lam MC, Clifford C, Oliver M, et al. (2016) Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners Journal of Micro/ Nanolithography, Mems, and Moems. 15 |
| Lam M, Clifford C, Oliver M, et al. (2015) Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners Proceedings of Spie - the International Society For Optical Engineering. 9426 |
| Civay D, Verduijn E, Clifford C, et al. (2015) Subresolution assist features in extreme ultraviolet lithography Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Sturtevant J, Buck P, Schulze S, et al. (2014) 14-nm photomask simulation sensitivity Proceedings of Spie - the International Society For Optical Engineering. 9231 |
| Fryer D, Lam M, Adam K, et al. (2014) Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk Proceedings of Spie - the International Society For Optical Engineering. 9052 |
| Lam MC, Adam K, Fryer D, et al. (2013) Accurate 3DEMF mask model for full-chip simulation Proceedings of Spie - the International Society For Optical Engineering. 8683 |