Qiaolin Zhang, Ph.D.

Affiliations: 
2006 University of California, Berkeley, Berkeley, CA, United States 
Area:
Control, Intelligent Systems, and Robotics (CIR), System identification; Design, Modeling and Analysis (DMA), Design for Manufacturability; Physical Electronics (PHY), Semiconductor Manufacturing
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"Qiaolin Zhang"
Cross-listing: Robotree

Parents

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Kameshwar Poolla grad student 2006 UC Berkeley
 (IC manufacturing performance enhancement through advanced process/equipment modeling, control and metrology.)
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Publications

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Zhang Q, Poolla K, Spanos CJ. (2008) One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process Journal of Process Control. 18: 937-945
Zhang Q, Tang C, Cain J, et al. (2007) Across-wafer CD uniformity control through lithography and etch process: Experimental verification Proceedings of Spie - the International Society For Optical Engineering. 6518
Zhang Q, Poolla K, Spanos CJ. (2007) Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment Ieee Transactions On Semiconductor Manufacturing. 20: 488-505
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