Qiaolin Zhang, Ph.D.
Affiliations: | 2006 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Control, Intelligent Systems, and Robotics (CIR), System identification; Design, Modeling and Analysis (DMA), Design for Manufacturability; Physical Electronics (PHY), Semiconductor ManufacturingGoogle:
"Qiaolin Zhang"Cross-listing: Robotree
Parents
Sign in to add mentorKameshwar Poolla | grad student | 2006 | UC Berkeley | |
(IC manufacturing performance enhancement through advanced process/equipment modeling, control and metrology.) |
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Publications
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Zhang Q, Poolla K, Spanos CJ. (2008) One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process Journal of Process Control. 18: 937-945 |
Zhang Q, Tang C, Cain J, et al. (2007) Across-wafer CD uniformity control through lithography and etch process: Experimental verification Proceedings of Spie - the International Society For Optical Engineering. 6518 |
Zhang Q, Poolla K, Spanos CJ. (2007) Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment Ieee Transactions On Semiconductor Manufacturing. 20: 488-505 |