Matthew J. Coppinger, Ph.D.

Affiliations: 
2011 Department of Electrical and Computer Engineering University of Delaware, Newark, DE, United States 
Area:
Electronics and Electrical Engineering
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James Kolodzey grad student 2011 University of Delaware
 (Characteristics of germanium-tin photodetectors and terahertz microbolometers.)
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Publications

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Kim S, Bhargava N, Gupta J, et al. (2014) Infrared photoresponse of GeSn/n-Ge heterojunctions grown by molecular beam epitaxy. Optics Express. 22: 11029-34
Kim S, Gupta J, Bhargava N, et al. (2013) Current-voltage characteristics of GeSn/Ge heterojunction diodes grown by molecular beam epitaxy Ieee Electron Device Letters. 34: 1217-1219
Bhargava N, Coppinger M, Prakash Gupta J, et al. (2013) Lattice constant and substitutional composition of GeSn alloys grown by molecular beam epitaxy Applied Physics Letters. 103
Coppinger M, Hart J, Bhargava N, et al. (2013) Photoconductivity of germanium tin alloys grown by molecular beam epitaxy Applied Physics Letters. 102
Coppinger M, Sustersic NA, Kolodzey J, et al. (2011) Sensitivity of a vanadium oxide uncooled microbolometer array for terahertz imaging Optical Engineering. 50
Nataraj L, Sustersic N, Coppinger M, et al. (2010) Structural and optical characterization of Germanium-rich islands on silicon grown by Molecular Beam Epitaxy Optics Infobase Conference Papers
Nataraj L, Sustersic N, Coppinger M, et al. (2010) Structural and optoelectronic properties of germanium-rich islands grown on silicon using molecular beam epitaxy Applied Physics Letters. 96
Sustersic N, Nataraj L, Weiland C, et al. (2009) Effects of boron and phosphorus doping on the photoluminescence of self-assembled germanium quantum dots Applied Physics Letters. 94
Aina L, Hier H, Fathimulla A, et al. (2009) High detectivity dilute nitride strained layer superlattice detectors for LWIR and VLWIR applications Infrared Physics and Technology. 52: 310-316
Xuan G, Adam TN, Lv PC, et al. (2008) Dry etching of SiGe alloys by xenon difluoride Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 385-388
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