Harold G. Parks
Affiliations: | Electrical & Computer Engineering | University of Arizona, Tucson, AZ |
Area:
Electronics and Electrical EngineeringGoogle:
"Harold Parks"Children
Sign in to add trainee| Viraj S. Pandit | grad student | 2006 | University of Arizona |
| Esko Mikkola | grad student | 2008 | University of Arizona |
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Publications
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| Siddiqui S, Dai M, Loesing R, et al. (2017) Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 12202 |
| Ramberg JS, Parks HG, Maanum KA. (2012) Semiconductor contamination: Eliciting a physical model through factorial experimentation Journal of Quality Technology. 44: 161-174 |
| Mikkola EO, Vermeire B, Parks HG, et al. (2007) VHDL-AMS modeling of total ionizing dose radiation effects on CMOS mixed signal circuits Ieee Transactions On Nuclear Science. 54: 929-934 |
| Mikkola E, Vermeire B, Chiu T, et al. (2007) Total dose radiation effect simulations on a high-precision data acquisition system Proceedings of the European Conference On Radiation and Its Effects On Components and Systems, Radecs |
| Pandit V, Parks HG, Vermeire B, et al. (2006) Wet cleaning of cross-contamination of high-k dielectrics in plasma etch tool Journal of the Electrochemical Society. 153 |
| Lowalekar V, Raghavan S, Pandit V, et al. (2006) Contamination of silicon dioxide films by aqueous zirconium and hafnium species Journal of Applied Physics. 99 |
| Vermeire B, Pandit VS, Parks HG, et al. (2004) Hafnium or zirconium high-k fab cross-contamination issues Ieee Transactions On Semiconductor Manufacturing. 17: 582-589 |
| Mikkola E, Vermeire B, Barnaby HJ, et al. (2004) SET tolerant CMOS comparator Ieee Transactions On Nuclear Science. 51: 3609-3614 |
| Mikkola E, Parks HG, Vermeire B, et al. (2003) Design, simulation and applicability of total dose ionizing radiation prognostic cells in a commercial 0.25μM process Proceedings of the Iasted International Conference On Circuits, Signals, and Systems. 214-219 |
| Peterson CA, Vermeire B, Sarid D, et al. (2001) Reduction of surface roughening due to copper contamination prior to ultra-thin gate oxidation Applied Surface Science. 181: 28-34 |