Lakshmanan H. Vanamurthy, Ph.D.
Affiliations: | 2013 | Nanoscale Science and Engineering-Nanoscale Engineering | State University of New York, Albany, Albany, NY, United States |
Area:
Nanoscience, Materials Science Engineering, NanotechnologyGoogle:
"Lakshmanan Vanamurthy"Parents
Sign in to add mentor| Hassaram Bakhru | grad student | 2013 | SUNY Albany | |
| (Understanding defect interactions in Si Ultra-shallow p-n junctions formed by very low energy Boron Implantation.) | ||||
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Publications
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| Vanamurthy LH, Huang M, Bakhru H, et al. (2013) Subnanometer-resolution depth profiling of boron atoms and lattice defects in silicon ultrashallow junctions by ion beam techniques Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31 |
| He M, Ou Y, Wang P, et al. (2010) Barrier Metal Ions Drift into Porous Low k Dielectrics under Bias-Temperature stress Mrs Proceedings. 1249 |
| Gaathon O, Ofan A, Dadap JI, et al. (2010) Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 462-465 |
| He M, Novak S, Vanamurthy L, et al. (2010) Cu penetration into low-k dielectric during deposition and bias-temperature stress Applied Physics Letters. 97 |
| Lilienblum M, Ofan A, Hoffmann A, et al. (2010) Low-voltage nanodomain writing in He-implanted lithium niobate crystals Applied Physics Letters. 96 |
| He M, Ou Y, Wang PI, et al. (2010) Barrier metal ions drift into porous low K dielectrics under bias-temperature stress Materials Research Society Symposium Proceedings. 1249: 231-235 |
| Look DC, Farlow GC, Yaqoob F, et al. (2009) In-implanted ZnO: Controlled degenerate surface layer Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1593-1596 |
| Chen TL, Kou A, Ofan A, et al. (2009) Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates Thin Solid Films. 518: 269-273 |
| Ou Y, Wang PI, Vanamurthy LH, et al. (2008) Thermal stability study of pore sealing using parylene N Journal of the Electrochemical Society. 155 |
| Ofan A, Gaathon O, Vanamurthy L, et al. (2008) Origin of highly spatially selective etching in deeply implanted complex oxides Applied Physics Letters. 93 |