Mingmei Wang, Ph.D.
Affiliations: | 2011 | Chemical and Biological Engineering | Iowa State University, Ames, IA, United States |
Area:
Chemical EngineeringGoogle:
"Mingmei Wang"Parents
Sign in to add mentor| Mark J. Kushner | grad student | 2011 | Iowa State | |
| (Modeling of complex surface interactions in low and high pressure plasmas.) | ||||
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Publications
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| Wang M, Ventzek PLG, Ranjan A. (2017) Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas Journal of Vacuum Science and Technology. 35: 31301 |
| Ranjan A, Wang M, Sherpa SD, et al. (2016) Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34 |
| Ranjan A, Wang M, Sherpa S, et al. (2015) Electron energy distribution control by fiat: Breaking from the conventional flux ratio scaling rules in etch Proceedings of Spie - the International Society For Optical Engineering. 9428 |
| Wang M, Kushner MJ. (2011) Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas Journal of Vacuum Science and Technology. 29: 51306 |
| Wang M, Foster JE, Kushner MJ. (2011) Plasma propagation through porous dielectric sheets Ieee Transactions On Plasma Science. 39: 2244-2245 |
| Wang M, Kushner MJ. (2010) High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics Journal of Applied Physics. 107: 23309 |
| Wang M, Kushner MJ. (2010) High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics Journal of Applied Physics. 107: 23308 |