Aaron J. Fleischman, Ph.D.
Affiliations: | 2000 | Case Western Reserve University, Cleveland Heights, OH, United States |
Area:
Electronics and Electrical Engineering, Materials Science EngineeringGoogle:
"Aaron Fleischman"Parents
Sign in to add mentorMehran Mehregany | grad student | 2000 | Case Western | |
(Silicon carbide thin films for high temperature microelectromechanical systems.) |
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Publications
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Zorman C, Eldridge A, Du J, et al. (2012) Amorphous silicon carbide as a non-biofouling structural material for biomedical microdevices Materials Science Forum. 717: 537-540 |
Nath P, Strelnik J, Vasanji A, et al. (2009) Development of multistage magnetic deposition microscopy. Analytical Chemistry. 81: 43-9 |
Eldridge AN, Dubnisheva A, Fissell WH, et al. (2007) Increased biocompatibility of common MEMS substrates with solution phase coupled poly(ethylene glycol) films Proceedings of the Asme Summer Bioengineering Conference 2007, Sbc 2007. 55-56 |
Fleischman A, Modi R, Nair A, et al. (2003) Miniature high frequency focused ultrasonic transducers for minimally invasive imaging procedures Sensors and Actuators a: Physical. 103: 76-82 |
Mehregany M, Zorman CA, Roy S, et al. (2000) Silicon carbide for microelectromechanical systems International Materials Reviews. 45: 85-108 |
Fleischman AJ, Roy S, Zorman CA, et al. (1998) Behaviour of Polycrystalline SiC and Si Surface-Micromachined Lateral Resonant Structures at Elevated Temperatures Materials Science Forum. 889-894 |
Wu CH, Fleischman AJ, Zorman CA, et al. (1998) Growth and characterization of SiC films on large-area Si wafers by APCVD - Temperature dependence Materials Science Forum. 264: 179-182 |
Zorman CA, Roy S, Wu C, et al. (1998) Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon Journal of Materials Research. 13: 406-412 |
Fleischman AJ, Zorman CA, Mehregany M. (1998) Etching of 3C-SiC using CHF3/O2 and CHF3/O2/He plasmas at 1.75 Torr Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 536-539 |
Zorman CA, Roy S, Wu CH, et al. (1998) Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon Journal of Materials Research. 13: 406-412 |