Nihar R. Mohanty, Ph.D.
Affiliations: | 2011 | Department of Chemical Engineering | Kansas State University, Manhattan, KS, United States |
Area:
Chemical Engineering, Materials Science Engineering, NanotechnologyGoogle:
"Nihar Mohanty"Parents
Sign in to add mentor| Vikas Berry | grad student | 2011 | Kansas State University | |
| (Structural and chemical derivatization of graphene for electronics and sensing.) | ||||
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Publications
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| Thibaut S, Raley A, Mohanty N, et al. (2017) Self-aligned quadruple patterning using spacer on spacer integration optimization for N5 Proceedings of Spie. 10149 |
| Mohanty N, Smith JT, Huli L, et al. (2017) EPE improvement thru self-alignment via multi-color material integration Proceedings of Spie. 10147: 1014704 |
| Liu E, Ko A, O'Meara D, et al. (2017) Roughness and uniformity improvements on self-aligned quadruple patterning technique for 10nm node and beyond by wafer stress engineering Proceedings of Spie. 10149 |
| Lazzarino F, Mohanty N, Feurprier Y, et al. (2017) Self-aligned block technology: a step toward further scaling Proceedings of Spie. 10149: 1014908 |
| Raley A, Mohanty N, Sun X, et al. (2017) Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning Proceedings of Spie. 10149 |
| Kal S, Mohanty N, Farrell RA, et al. (2017) Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation) Proceedings of Spie. 10149 |
| Raley A, Thibaut S, Mohanty N, et al. (2016) Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications Proceedings of Spie - the International Society For Optical Engineering. 9782 |
| Mohanty N, Farrell R, Periera C, et al. (2016) LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782 |
| Liu CC, Lie FL, Rastogi V, et al. (2015) Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423 |
| Mohanty N, Franke E, Liu E, et al. (2015) Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme Proceedings of Spie - the International Society For Optical Engineering. 9428 |