Lawrence J. Overzet
Affiliations: | Electrical Engineering | University of Texas at Dallas, Richardson, TX, United States |
Area:
Electronics and Electrical EngineeringGoogle:
"Lawrence Overzet"Children
Sign in to add traineeMarwan H. Khater | grad student | 2000 | UT Dallas |
Jennifer L. Kleber | grad student | 2000 | UT Dallas |
Sivananda K. Kanakasabapathy | grad student | 2001 | UT Dallas |
Baosuo Zhou | grad student | 2004 | UT Dallas |
Eric A. Joseph | grad student | 2005 | UT Dallas |
Anand Chandrashekar | grad student | 2006 | UT Dallas |
Yonghua Liu | grad student | 2006 | UT Dallas |
Sanket P. Sant | grad student | 2006 | UT Dallas |
Seetharaman Ramachandran | grad student | 2008 | UT Dallas |
Gabriel Padron Wells | grad student | 2011 | UT Dallas |
Iqbal R. Saraf | grad student | 2011 | UT Dallas |
Isabel C. Estrada Raygoza | grad student | 2012 | UT Dallas |
Daisuke Ogawa | grad student | 2012 | UT Dallas |
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Publications
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Hernandez K, Overzet LJ, Goeckner MJ. (2020) Electron dynamics during the reignition of pulsed capacitively-coupled radio-frequency discharges Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 38: 34005 |
Press AF, Goeckner MJ, Overzet LJ. (2019) Sub-rf period electrical characterization of a pulsed capacitively coupled argon plasma Journal of Vacuum Science & Technology B. 37: 062926 |
Michaud R, Felix V, Stolz A, et al. (2018) Direct current microhollow cathode discharges on silicon devices operating in argon and helium Plasma Sources Science and Technology. 27: 25005 |
Poulose J, Goeckner M, Shannon S, et al. (2017) Driving frequency fluctuations in pulsed capacitively coupled plasmas The European Physical Journal D. 71 |
Sundaram NG, Ramachandran S, Overzet L, et al. (2016) Study of layered diamond like carbon and PECVD fluorocarbon films for ultra low dielectric constant interlayer dielectric applications Journal of Materials Research. 1-11 |
Felix V, Lefaucheux P, Aubry O, et al. (2016) Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices Plasma Sources Science and Technology. 25 |
Sundaram N, Lee GS, Goeckner M, et al. (2015) Study and optimization of PECVD films containing fluorine and carbon as ultra low dielectric constant interlayer dielectrics in ULSI devices Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33 |
Urrabazo D, Veyan JF, Goeckner MJ, et al. (2015) Ion induced electron emission from chemically cleaned Si and Ge Journal of Physics D: Applied Physics. 48 |
Urrabazo D, Overzet LJ. (2015) The effects of the Fermi level on ion induced electron emission from chemically and sputter cleaned semiconductors Journal of Physics D: Applied Physics. 48 |
Bates RL, Goeckner MJ, Overzet LJ. (2014) Correction of aspect ratio dependent etch disparities Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32 |