Shisheng Xiong, Ph.D.
Affiliations: | 2011 | Chemical Engineering | University of New Mexico, Albuquerque, NM, United States |
Area:
Materials Science Engineering, NanoscienceGoogle:
"Shisheng Xiong"Parents
Sign in to add mentor| C. Jeffrey Brinker | grad student | 2011 | Univ. of New Mexico | |
| (Functional 2D nanoparticle/polymer array: Interfacial assembly, transfer, characterization, and coupling to photonic crystal cavities.) | ||||
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Publications
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| Song Q, Zhou J, Dong Q, et al. (2024) Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes. Langmuir : the Acs Journal of Surfaces and Colloids |
| Hu XH, Zhang R, Zhang X, et al. (2024) Focused solar annealing for block copolymer fast self-assembly. Heliyon. 10: e24016 |
| Jacobberger RM, Thapar V, Wu GP, et al. (2020) Boundary-directed epitaxy of block copolymers. Nature Communications. 11: 4151 |
| Zhao Y, Zhang Z, Zhang H, et al. (2020) Three-Dimensional PrGO-Based Sandwich Composites With MoS Flowers as Stuffings for Superior Lithium Storage. Frontiers in Chemistry. 8: 94 |
| Zhang Z, Xu P, Weng Y, et al. (2020) Nanotube network arrays with nickel oxide canopies as flexible high-energy anodes for lithium storage Journal of Alloys and Compounds. 847: 156366 |
| Li D, Zhou C, Xiong S, et al. (2019) Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid. Soft Matter |
| Zhou C, Dolejsi M, Xiong S, et al. (2019) Combining block copolymer lithography with self-aligned double patterning to achieve 10.5 nm full-pitch line/space patterns. Nanotechnology |
| Xiong S, Li D, Hur S, et al. (2018) The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing Macromolecules. 51: 7145-7151 |
| Zhang Q, Matsuoka F, Suh HS, et al. (2017) Pathways to Mesoporous Resin/Carbon Thin Films with Alternating Gyroid Morphology. Acs Nano |
| Chang TH, Xiong S, Liu CC, et al. (2017) The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning. Macromolecular Rapid Communications |