Hong Shi, Ph.D.
Affiliations: | 2012 | Chemical Engineering | University of Utah, Salt Lake City, UT |
Area:
Chemical Engineering, General Engineering, Mechanical EngineeringGoogle:
"Hong Shi"Parents
Sign in to add mentorTerry A. Ring | grad student | 2012 | University of Utah | |
(Modeling pad wear and pad conditioning in chemical-mechanical polishing using population balance model.) |
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Publications
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Shi H, Ring TA. (2010) CMP pad wear and polish-rate decay modeled by asperity population balance with fluid effect Microelectronic Engineering. 87: 2368-2375 |
Shi H, Ring TA. (2010) Analytical solution for polish-rate decay in chemical-mechanical polishing Journal of Engineering Mathematics. 68: 207-211 |