Sairam Agraharam, Ph.D.

Affiliations: 
2000 Georgia Institute of Technology, Atlanta, GA 
Area:
Chemical Engineering, Electronics and Electrical Engineering
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"Sairam Agraharam"

Parents

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Sue A. Bidstrup Allen grad student 2000 Georgia Tech
 (Plasma assisted deposition of low dielectric constant fluorocarbon materials for microelectronic applications.)
Paul Albert Kohl grad student 2000 Georgia Tech
 (Plasma assisted deposition of low dielectric constant fluorocarbon materials for microelectronic applications.)
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Publications

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Tanikella RV, Agraharam S, Allen SAB, et al. (2002) Moisture absorption studies of fluorocarbon films deposited from pentafluoroethane and octafluorocyclobutane plasmas Journal of Electronic Materials. 31: 1096-1103
Agraharam S, Hess DW, Kohl PA, et al. (2001) Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas Journal of the Electrochemical Society. 148
Agraharam S, Hess DW, Kohl PA, et al. (2001) Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 439-446
Agraharam S, Hess DW, Kohl PA, et al. (2000) Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas Journal of the Electrochemical Society. 147: 2665-2670
Agraharam S, Hess DW, Kohl PA, et al. (1999) Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 3265-3271
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