Sairam Agraharam, Ph.D.
Affiliations: | 2000 | Georgia Institute of Technology, Atlanta, GA |
Area:
Chemical Engineering, Electronics and Electrical EngineeringGoogle:
"Sairam Agraharam"Parents
Sign in to add mentorSue A. Bidstrup Allen | grad student | 2000 | Georgia Tech | |
(Plasma assisted deposition of low dielectric constant fluorocarbon materials for microelectronic applications.) | ||||
Paul Albert Kohl | grad student | 2000 | Georgia Tech | |
(Plasma assisted deposition of low dielectric constant fluorocarbon materials for microelectronic applications.) |
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Publications
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Tanikella RV, Agraharam S, Allen SAB, et al. (2002) Moisture absorption studies of fluorocarbon films deposited from pentafluoroethane and octafluorocyclobutane plasmas Journal of Electronic Materials. 31: 1096-1103 |
Agraharam S, Hess DW, Kohl PA, et al. (2001) Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas Journal of the Electrochemical Society. 148 |
Agraharam S, Hess DW, Kohl PA, et al. (2001) Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 439-446 |
Agraharam S, Hess DW, Kohl PA, et al. (2000) Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas Journal of the Electrochemical Society. 147: 2665-2670 |
Agraharam S, Hess DW, Kohl PA, et al. (1999) Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 3265-3271 |