Jeffery P. Langer, Ph.D.

Affiliations: 
2005 Rensselaer Polytechnic Institute, Troy, NY, United States 
Area:
Electronics and Electrical Engineering, Materials Science Engineering
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"Jeffery Langer"

Parents

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Partha S. Dutta grad student 2005 RPI
 (Plasma etching of antimonide based III-V semiconductor materials and device structures.)
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Publications

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Bhagwat V, Langer JP, Bhat I, et al. (2004) A comparison of dry plasma and wet chemical etching of GaSb photodiodes Journal of the Electrochemical Society. 151
Bhagwat V, Langer JP, Bhat I, et al. (2003) Comparison of GaSb p-n junction photodiodes fabricated using Cl2/Ar and Cl2/BCl3/CH4/Ar/H2 plasma Ieee International Symposium On Compound Semiconductors, Proceedings. 2003: 220-225
Bhagwat V, Langer JP, Bhat IB, et al. (2003) A comparison of dry plasma and wet chemical passivation of GaSb photodiodes Ieee International Symposium On Compound Semiconductors, Proceedings. 2003: 179-180
Langer JP, Dutta PS. (2003) Electron cyclotron resonance plasma etching of GaSb in Cl 2/BCl3/CH4/Ar/H2 at room temperature Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 1511-1512
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