Manas Ojha, Ph.D.
Affiliations: | 2008 | Rensselaer Polytechnic Institute, Troy, NY, United States |
Area:
Chemical EngineeringGoogle:
"Manas Ojha"Parents
Sign in to add mentor| Joel L. Plawsky | grad student | 2008 | RPI | |
| (Contact line wettability and transport during phase change processes from nanostructured surfaces.) | ||||
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Publications
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| Ojha M, Chatterjee A, Dalakos G, et al. (2010) Role of solid surface structure on evaporative phase change from a completely wetting corner meniscus Physics of Fluids. 22: 1-15 |
| Ojha M, Chatterjee A, Mont F, et al. (2010) The role of solid surface structure on dropwise phase change processes International Journal of Heat and Mass Transfer. 53: 910-922 |
| Plawsky JL, Ojha M, Chatterjee A, et al. (2009) Review of the effects of surface topography, surface chemistry, and fluid physics on evaporation at the contact line Chemical Engineering Communications. 196: 658-696 |
| Ojha M, Gill WN, Plawsky JL, et al. (2006) Fabrication of ultrathin (∼100 nm), low-index nanoporous silica films for photonic devices: Role of substrate adhesion on the film thickness Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1109-1116 |
| Xi JQ, Ojha M, Cho W, et al. (2006) Internal omni-directional reflector using a low refractive index material for light-emitting diodes Optics Infobase Conference Papers |
| Xi JQ, Ojha M, Cho W, et al. (2006) Internal omni-directional reflector using a low refractive index material for light-emitting diodes Optics Infobase Conference Papers |
| Xi JQ, Ojha M, Cho W, et al. (2005) Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material. Optics Letters. 30: 1518-20 |
| Xi JQ, Ojha M, Cho W, et al. (2005) Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material Optics Letters. 30: 1518-1520 |
| Cho W, Saxena R, Rodriguez O, et al. (2005) Polymer penetration and pore sealing in nanoporous silica by CHF |
| Cho W, Rodriguez O, Saxena R, et al. (2005) A model for the etching of nanoporous silica in C4F8 plasmas based on pore geometry and porosity effects Journal of the Electrochemical Society. 152 |