Ramarajesh Katamreddy, Ph.D.

Affiliations: 
2007 University of Illinois at Chicago, Chicago, IL, United States 
Area:
Chemical Engineering
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"Ramarajesh Katamreddy"

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Christos G. Takoudis grad student 2007 University of Illinois, Chicago
 (Structural and interfacial studies of atomic layer deposited high-k materials on silicon.)
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Publications

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Katamreddy R, Stafford NA, Guerin L, et al. (2009) Atomic layer deposition of rare-earth oxide thin films for high-κ dielectric applications Ecs Transactions. 19: 525-536
Katamreddy R, Wang Z, Omarjee V, et al. (2009) Advanced precursor development for Sr and Ti based oxide thin film applications Ecs Transactions. 25: 217-230
Katamreddy R, Omarjee V, Feist B, et al. (2008) Tuning of material and electrical properties of strontium titanates using process chemistry and composition Ecs Transactions. 16: 487-496
Katamreddy R, Omarjee V, Feist B, et al. (2008) Ti source precursors for atomic layer deposition of TiO 2, STO and BST Ecs Transactions. 16: 113-122
Katamreddy R, Feist B, Takoudis C. (2008) Bis(diethylamino) silane as the silicon precursor in the atomic layer deposition of HfSiOx Journal of the Electrochemical Society. 155
Katamreddy R, Inman R, Jursich G, et al. (2008) Nitridation and oxynitridation of Si to control interfacial reaction with HfO2 Thin Solid Films. 516: 8498-8506
Katamreddy R, Inman R, Jursich G, et al. (2008) Effect of film composition and structure on the crystallization point of atomic layer deposited HfAlOx using metal (diethylamino) precursors and ozone Acta Materialia. 56: 710-718
Singh MK, Rosado J, Katamreddy R, et al. (2007) Investigation of local coordination and electronic structure of dielectric thin films from theoretical energy-loss spectra Materials Research Society Symposium Proceedings. 996: 121-126
Singh MK, Katamreddy R, Takoudis CG. (2007) Effect of oxidizer on chemical vapor deposited hafnium oxide-based nanostructures and the engineering of their interfaces with Si(100) Materials Research Society Symposium Proceedings. 996: 98-102
Katamreddy R, Inman R, Jursich G, et al. (2007) Atomic layer deposition of HfO2, Al2O3, and HfAlOx using O3 and metal(diethylamino) precursors Journal of Materials Research. 22: 3455-3464
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