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Edward G. Lovell

Affiliations: 
University of Wisconsin, Madison, Madison, WI 
Area:
Mechanical Engineering, Materials Science Engineering
Website:
https://directory.engr.wisc.edu/me/Faculty/Lovell_Edward/
Google:
"Edward George Lovell" OR "Edward G Lovell"
Bio:

https://deepblue.lib.umich.edu/bitstream/handle/2027.42/6366/bac9417.0001.001.pdf?sequence=5

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Parents

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Ivor K. McIvor grad student 1967 University of Michigan
 (The Cylindrical Shell of Finite Length Under a Nearly Uniform Radial Impulse)

Children

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Roxann L. Engelstad grad student 1988 UW Madison
Anton F. Jachim grad student 2001 UW Madison
Jaehyuk Chang grad student 2003 UW Madison
Po-Tung Lee grad student 2003 UW Madison

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Publications

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Zheng L, Engelstad RL, Lovell EG. (2005) Investigation of overlay errors due to the interaction of optical and extreme ultraviolet mask fabrication processes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 3043-3046
Dicks G, Mikkelson A, Engelstad R, et al. (2005) Predicting the dynamic response of an extreme ultraviolet reticle during exposure scanning Journal of Vacuum Science & Technology B. 23: 2856-2859
Engelstad RL, Feng Z, Lovell EG, et al. (2005) Evaluation of intrinsic film stress distributions from induced substrate deformation Microelectronic Engineering. 78: 404-409
Chang J, Engelstad RL, Lovell EG, et al. (2004) Simulating the process flow of the Nikon EPL new geometry mask Proceedings of Spie - the International Society For Optical Engineering. 5567: 1278-1288
Azkorra X, Mikkelson AR, Engelstad RL, et al. (2004) Modeling LEEPL mask fabrication processes Proceedings of Spie - the International Society For Optical Engineering. 5374: 1068-1079
Abdo AY, Engelstad RL, Beckman WA, et al. (2004) Thermal response of optical reticles: Experimental verification of finite element models Journal of Microlithography, Microfabrication and Microsystems. 3: 232-238
Schuetter SD, Dicks GA, Nellis GF, et al. (2004) Controlling imprint distortions in step-and-flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3312-3317
Eguchi H, Susa T, Sumida T, et al. (2004) Stress and image-placement distortions of 200 mm low-energy electron projection lithography masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3087-3091
Mikkelson A, Engelstad R, Sohn J, et al. (2004) Effect of electrostatic chucking and substrate thickness uniformity on extreme ultraviolet lithography mask flatness Journal of Vacuum Science & Technology B. 22: 3043-3048
Chang J, Engelstad RL, Lovell EG, et al. (2004) Assessment of image placement errors induced in electron projection lithography masks by chucking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3077-3081
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