Jung R. Chung, Ph.D.
Affiliations: | 2003 | Texas A & M University, College Station, TX, United States |
Area:
Biomedical Engineering, Electronics and Electrical EngineeringGoogle:
"Jung Chung"Parents
Sign in to add mentor| Gerard Cote | grad student | 2003 | Texas A & M | |
| (A novel automated Mueller matrix polarization imaging system for skin cancer detection.) | ||||
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Publications
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| Barnard R, Pauca VP, Torgersen TC, et al. (2006) High-resolution iris image reconstruction from low-resolution imagery Proceedings of Spie - the International Society For Optical Engineering. 6313 |
| Chung JR, DeLaughter AH, Baba JS, et al. (2003) Interpretation Mueller matrix images based on polar decomposition and statistical discriminators to distinguish skin cancer Proceedings of Spie - the International Society For Optical Engineering. 4961: 147-152 |
| Baldwin AM, Chung JR, Baba JS, et al. (2003) Mueller Matrix Imaging for Cancer Detection Annual International Conference of the Ieee Engineering in Medicine and Biology - Proceedings. 2: 1027-1030 |
| Baba JS, Chung JR, DeLaughter AH, et al. (2002) Development and calibration of an automated Mueller matrix polarization imaging system. Journal of Biomedical Optics. 7: 341-9 |
| Chung JR, Baba JS, DeLaughter AH, et al. (2002) Development and use of a novel automated Mueller matrix polarization imaging system for in-vivo imaging of lesions Proceedings of Spie - the International Society For Optical Engineering. 4613: 111-117 |
| Baba JS, Chung JR, Coté GL. (2002) Laser polarization noise elimination in sensitive polarimetric systems Optical Engineering. 41: 938-942 |
| Chung JR, Coté GL, DeLaughter AH, et al. (2002) Analysis of Mueller matrix images by polar decomposition Annual International Conference of the Ieee Engineering in Medicine and Biology - Proceedings. 3: 2308-2309 |
| Hill AR, Cameron BD, Chung JR, et al. (2001) Development and calibration of an automated Mueller matrix polarization system for skin lesion differentiation Proceedings of Spie - the International Society For Optical Engineering. 4250: 449-454 |