Dale E. Niesz
Affiliations: | Rutgers University, New Brunswick, New Brunswick, NJ, United States |
Area:
Materials Science EngineeringGoogle:
"Dale Niesz"Children
Sign in to add traineeHonglin Zhu | grad student | 2002 | Rutgers, New Brunswick |
Bryan W. McEnerney | grad student | 2005 | Rutgers, New Brunswick |
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Publications
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Bakas M, McCauley JW, Greenhut V, et al. (2012) Quantitative analysis of inclusion distributions in hot pressed silicon carbide International Journal of Impact Engineering. 50: 40-48 |
Brennan R, Haber R, Niesz D, et al. (2012) Defect Engineering of Samples for Non‐Destructive Evaluation (NDE) Ultrasound Testing Ceramic Transactions. 178: 103-108 |
Labropoulos KC, Niesz DE, Danforth SC. (2012) Modeling the Dynamic Rheological Bebavior of Agar Based Aqueous Binders Ceramic Transactions. 129: 53-65 |
Rossi MA, Matthewson MJ, Kaza A, et al. (2010) Modeling of Gas-Phase Transport and Composition Evolution during the Initial-Stage Sintering of Boron Carbide with Carbon Additions Journal of the American Ceramic Society. 93: 3691-3699 |
Kaza A, Matthewson MJ, Niesz D, et al. (2009) A Model of Gas-Phase Transport During the Initial Stages of Sintering of Silicon Carbide Journal of the American Ceramic Society. 92: 2517-2527 |
Brennan R, Haber R, Niesz D, et al. (2008) Ultrasonic Evaluation of High‐Density Silicon Carbide Ceramics International Journal of Applied Ceramic Technology. 5: 210-218 |
Fanchini G, McCauley JW, Niesz DE, et al. (2005) The role of multiple polytypes in determining the catastrophic failure of boron carbide at high shock velocities Materials Research Society Symposium Proceedings. 904: 37-42 |
Zhu H, Niesz DE, Greenhut VA, et al. (2005) The effect of abrasive hardness on the chemical-assisted polishing of (0001) plane sapphire Journal of Materials Research. 20: 504-520 |
Bakas MP, Greenhut VA, Niesz DE, et al. (2004) Anomalous defects and dynamic failure of armor ceramics International Journal of Applied Ceramic Technology. 1: 211-218 |
Zhu H, Tessaroto LA, Sabia R, et al. (2004) Chemical mechanical polishing (CMP) anisotropy in sapphire Applied Surface Science. 236: 120-130 |