Kyuhwan Chang, Ph.D.
Affiliations: | 2005 | Pennsylvania State University, State College, PA, United States |
Area:
Electronics and Electrical Engineering, Materials Science Engineering, Condensed Matter PhysicsGoogle:
"Kyuhwan Chang"Parents
Sign in to add mentor| J Ruzyllo | grad student | 2005 | Penn State | |
| (Engineering of semiconductor -dielectric interface in MOS gate structures.) | ||||
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Publications
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| Wu CH, Huang BW, Chang KM, et al. (2016) The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. Journal of Nanoscience and Nanotechnology. 16: 6044-8 |
| Chang K, Shanmugasundaram K, Shallenberger J, et al. (2007) Studies of Hf(Si,O) dielectrics for metal-oxide-semiconductor applications Thin Solid Films. 515: 3802-3805 |
| Shanmugasundaram K, Brubaker M, Chang K, et al. (2007) Studies of solution processed metal oxides on silicon Microelectronic Engineering. 84: 2294-2297 |
| Chang K, Chang FM, Ruzyllo J. (2006) Charge trapping in HfO2 and HfSiO4 MOS gate dielectrics Solid-State Electronics. 50: 1670-1672 |
| Chang K, Shanmugasundaram K, Lee DO, et al. (2004) Silicon surface treatments in advanced MOS gate processing Microelectronic Engineering. 72: 130-135 |