Fernando Brizuela, Ph.D.

Affiliations: 
2010 Colorado State University, Fort Collins, CO 
Area:
Electronics and Electrical Engineering, Optics Physics
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"Fernando Brizuela"

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Carmen S. Menoni grad student 2010 Colorado State
 (Table-top, full-field, actinic microscope for Extreme Ultraviolet Lithography mask characterization.)
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Publications

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Maclot S, Coudert-Alteirac H, Campi F, et al. (2015) Towards XUV-pump XUV-probe experiments with attosecond pulses at the Lund Laser Centre Journal of Physics: Conference Series. 635: 112079
Jarnac A, Brizuela F, Heyl CM, et al. (2014) Compression of TW class laser pulses in a planar hollow waveguide for applications in strong-field physics European Physical Journal D. 68
Brizuela F, Heyl CM, Rudawski P, et al. (2013) Efficient high-order harmonic generation boosted by below-threshold harmonics. Scientific Reports. 3: 1410
Carbajo S, Howlett ID, Brizuela F, et al. (2012) Sequential single-shot imaging of nanoscale dynamic interactions with a table-top soft x-ray laser. Optics Letters. 37: 2994-6
Carbajo S, Howlett ID, Brizuela F, et al. (2012) Sequential single-shot imaging of nanoscale dynamic interactions with a table-top soft x-ray laser Optics Letters. 37: 2994-2996
Brizuela F, Howlett ID, Carbajo S, et al. (2012) Imaging at the nanoscale with practical table-top euv laser-based full-field microscopes Ieee Journal On Selected Topics in Quantum Electronics. 18: 434-442
Howlett ID, Brizuela F, Carbajo S, et al. (2011) Assessment of illumination characteristics of soft x-ray laser-based full-field microscopes Proceedings of Spie - the International Society For Optical Engineering. 8140
Brizuela F, Carbajo S, Sakdinawat A, et al. (2010) Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks. Optics Express. 18: 14467-73
Carbajo S, Brizuela F, Sakdinawat A, et al. (2010) Movies At The Nanoscale Using Extreme Ultraviolet Laser Light Frontiers in Optics
Carbajo S, Brizuela F, Martz DH, et al. (2010) Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks 2010 23rd Annual Meeting of the Ieee Photonics Society, Photinics 2010. 584-585
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