Guy M. Burrow, Ph.D.
Affiliations: | 2012 | Georgia Institute of Technology, Atlanta, GA |
Area:
Electronics and Electrical EngineeringGoogle:
"Guy Burrow"Parents
Sign in to add mentorThomas K. Gaylord | grad student | 2012 | Georgia Tech | |
(Pattern-Integrated Interference Lithography: Single-exposure formation of photonic-crystal lattices with integrated functional elements.) |
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Publications
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Gaylord TK, Leibovici MC, Burrow GM. (2013) Pattern-integrated interference [Invited]. Applied Optics. 52: 61-72 |
Leibovici MC, Burrow GM, Gaylord TK. (2012) Pattern-integrated interference lithography: prospects for nano- and microelectronics. Optics Express. 20: 23643-52 |
Burrow GM, Leibovici MC, Kummer JW, et al. (2012) Pattern-integrated interference lithography instrumentation. The Review of Scientific Instruments. 83: 063707 |
Burrow GM, Leibovici MC, Gaylord TK. (2012) Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures. Applied Optics. 51: 4028-41 |
Burrow GM, Leibovici MCR, Gaylord TK. (2012) Pattern-Integrated Interference Lithography Demonstration Frontiers in Optics |
Burrow GM, Gaylord TK. (2012) Parametric constraints in multi-beam interference Journal of Micro/Nanolithography, Mems, and Moems. 11: 043004-1 |
Stay JL, Burrow GM, Gaylord TK. (2011) Three-beam interference lithography methodology. The Review of Scientific Instruments. 82: 023115 |
Burrow GM, Gaylord TK. (2011) Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures Micromachines. 2: 221-257 |
Burrow GM, Gaylord TK. (2011) Interference Projection Exposure System Frontiers in Optics |
Burrow GM, Gaylord TK. (2010) Constrained Parametric Optimization of Point Geometries in Multi-Beam-Interference Lithography Frontiers in Optics |