Eugene J. Rymaszewski

Affiliations: 
Rensselaer Polytechnic Institute, Troy, NY, United States 
Area:
Materials Science Engineering
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"Eugene Rymaszewski"
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Publications

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Jain P, Juneja JS, Mallikarjunan A, et al. (2006) Copper drift in high-dielectric-constant tantalum oxide thin films under bias temperature stress Applied Physics Letters. 88
Jain P, Juneja JS, Bhagwat V, et al. (2005) Effects of substrate temperature on properties of pulsed dc reactively sputtered tantalum oxide films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 512-519
Jain P, Bhagwat V, Rymaszewski EJ, et al. (2003) Model relating process variables to film electrical properties for reactively sputtered tantalum oxide thin films Journal of Applied Physics. 93: 3596-3604
Jain P, Juneja JS, Karabacak T, et al. (2002) Surface Roughness Evolution in Amorphous Tantalum Oxide Films Deposited by Pulsed Reactive Sputtering Materials Research Society Symposium - Proceedings. 749: 107-112
Kim J, Garg A, Rymaszewski EJ, et al. (2001) High frequency response of amorphous tantalum oxide thin films Ieee Transactions On Components and Packaging Technologies. 24: 526-533
Nielsen MC, Kim JY, Rymaszewski EJ, et al. (1998) Composite and multilayered TaOx-TiOy high dielectric constant thin films Ieee Transactions On Components Packaging and Manufacturing Technology Part B. 21: 274-279
Beckage PJ, Knorr DB, Wu XM, et al. (1998) Discrete β-Ta2O5 crystallite formation in reactively sputtered amorphous thin films Journal of Materials Science. 33: 4375-4379
Chen K, Nielsen M, Soss S, et al. (1997) Study of tantalum oxide thin film capacitors on metallized polymer sheets for advanced packaging applications Ieee Transactions On Components, Packaging, and Manufacturing Technology: Part B. 20: 117-122
Chen K, Yang GR, Nielsen M, et al. (1997) X-ray photoelectron spectroscopy study of Al/Ta2O5 and Ta2O5/Al buried interfaces Applied Physics Letters. 70: 399-401
Singh PK, Cochrane S, Liu WT, et al. (1995) High-frequency response of capacitors fabricated from fine grain BaTiO3 thin films Applied Physics Letters. 3683
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