☰

Gul B. Basim, Ph.D.

Affiliations: 
2002 University of Florida, Gainesville, Gainesville, FL, United States 
Area:
Materials Science Engineering
Google:
"Gul Basim"
Tree Publications Similar researchers PubMed Report error

Parents

Sign in to add mentor
Brij M. Moudgil grad student 2002 UF Gainesville
 (Formulation of engineered particulate systems for chemical mechanical polishing applications.)

Children

Sign in to add trainee

Collaborators

Sign in to add collaborator
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Cerhan A, Ozdemir Z, Basim GB. (2018) Self-Cleaning Ability Quantization of Textiles with Degussa P-25 Materials Science Forum. 915: 129-134
Akbar W, Karagoz A, Basim G, et al. (2015) Nano-boron as an Antibacterial Agent for Functionalized Textiles Mrs Proceedings. 1793: 53-57
Karagoz A, Mai J, Basim GB. (2015) Understanding selectivity on germanium/SiO2 chemical mechanical planarization through design of experiments Materials Research Society Symposium Proceedings. 1790: 19-24
Kincal S, Basim G. (2012) Impact of Pad Conditioning on Thickness Profile Control in Chemical Mechanical Planarization Journal of Electronic Materials. 42: 83-96
Vakarelski IU, Brown SC, Basim GB, et al. (2010) Tailoring silica nanotribology for CMP slurry optimization: Ca(2+) cation competition in C(12)TAB mediated lubrication. Acs Applied Materials & Interfaces. 2: 1228-35
Basim GB, Vakarelski IU, Moudgil BM. (2003) Role of interaction forces in controlling the stability and polishing performance of CMP slurries. Journal of Colloid and Interface Science. 263: 506-15
Basim GB, Moudgil BM. (2003) Slurry Design for Chemical Mechanical Polishing Kona Powder and Particle Journal. 21: 178-184
Basim GB, Moudgil BM. (2002) Effect of soft agglomerates on CMP slurry performance Journal of Colloid and Interface Science. 256: 137-142
Basim GB, Vakarelski I, Singh P, et al. (2002) Engineering the interaction forces to optimize CMP performance Materials Research Society Symposium Proceedings. 732: 73-77
Basim GB, Adler JJ, Mahajan U, et al. (2000) Effect of particle size of chemical mechanical polishing slurries for enhanced polishing with minimal defects Journal of the Electrochemical Society. 147: 3523-3528
See more...