Ho Gyoung Kim
Affiliations: | 2007 | Purdue University, West Lafayette, IN, United States |
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"Ho Kim"Parents
Sign in to add mentor| Timothy D. Sands | grad student | 2007 | Purdue | |
| (Effect of interface characteristics on electrical properties of metal-gallium nitride heterostructures.) | ||||
Children
Sign in to add trainee| Choon Y. Kim | grad student | 2011 | Purdue |
| Chih-Yu Chen | grad student | 2013 | Purdue |
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Publications
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| Kim H, Choi S, Choi BJ. (2020) Influence of AlN and GaN Pulse Ratios in Thermal Atomic Layer Deposited AlGaN on the Electrical Properties of AlGaN/GaN Schottky Diodes The Coatings. 10: 489 |
| Kim H, Choi S, Choi BJ. (2020) Forward Current Transport Properties of AlGaN/GaN Schottky Diodes Prepared by Atomic Layer Deposition The Coatings. 10: 194 |
| Kim H, Yun HJ, Choi S, et al. (2020) Atomic Layer Deposition of AlGaN on GaN and Current Transport Mechanism in AlGaN/GaN Schottky Diodes Materials Transactions. 61: 88-93 |
| Kim H, Yun HJ, Choi S, et al. (2020) Interfacial and electrical properties of nanolaminated HfO2/Al2O3 dielectrics on GaN with an AlN interlayer Semiconductor Science and Technology. 35: 15012 |
| Kim H, Jung MJ, Choi S, et al. (2020) ALD growth of ZnO on p-Si and electrical characterization of ZnO/p-Si heterojunctions Materials Today Communications. 25: 101265 |
| Choi S, Ansari AS, Yun HJ, et al. (2020) Growth of Al-rich AlGaN thin films by purely thermal atomic layer deposition Journal of Alloys and Compounds. 157186 |
| Yun HJ, Kim H, Choi BJ. (2020) Nucleation and growth behavior of aluminum nitride film using thermal atomic layer deposition Ceramics International. 46: 13372-13376 |
| Kim H, Yun HJ, Choi S, et al. (2020) Atomic Layer Deposition of AlN Thin Films on GaN and Electrical Properties in AlN/GaN Heterojunction Diodes Transactions On Electrical and Electronic Materials |
| Kim H, Yun HJ, Choi S, et al. (2020) Comparison of electrical and interfacial characteristics between atomic-layer-deposited AlN and AlGaN on a GaN substrate Applied Physics A. 126: 1-7 |
| 윤희주, 김호경, 최병준, et al. (2019) Growth of Aluminum Nitride Thin Films by Atomic Layer Deposition and Their Applications: A Review Korean Journal of Materials Research. 29: 567-577 |