Matteo Chiesa, Ph.D.
Affiliations: | Mechanical Engineering | Massachusetts Institute of Technology, Cambridge, MA, United States | |
| Masdar Institute of Science and Technology |
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"Matteo Chiesa"
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| Tamalampudi SR, Santos S, Lai CY, et al. (2020) Rapid discrimination of chemically distinctive surface terminations in 2D material based heterostructures by direct van der Waals identification. The Review of Scientific Instruments. 91: 023907 |
| Lai CY, Santos S, Moser T, et al. (2020) Explaining doping in material research (Hf substitution in ZnO films) by directly quantifying the van der Waals force. Physical Chemistry Chemical Physics : Pccp |
| Alfakes B, Garlisi C, Villegas J, et al. (2020) Enhanced photoelectrochemical performance of atomic layer deposited Hf-doped ZnO Surface and Coatings Technology. 385: 125352 |
| Lai C, Santos S, Chiesa M. (2019) Machine learning assisted quantification of graphitic surfaces exposure to defined environments Applied Physics Letters. 114: 241601 |
| Alfakes B, Villegas J, Apostoleris H, et al. (2019) Optoelectronic Tunability of Hf-Doped ZnO for Photovoltaic Applications The Journal of Physical Chemistry C. 123: 15258-15266 |
| Chiou YC, Olukan T, Ali Almahri M, et al. (2018) Direct Measurement of the Magnitude of van der Waals interaction of Single and Multilayer Graphene. Langmuir : the Acs Journal of Surfaces and Colloids |
| Lu JY, Lai CY, Almansoori I, et al. (2018) The evolution in graphitic surface wettability with first-principles quantum simulations: the counterintuitive role of water. Physical Chemistry Chemical Physics : Pccp |
| Chiesa M, Lai CY. (2018) Surface aging investigation by means of an AFM-based methodology and the evolution of conservative nanoscale interactions. Physical Chemistry Chemical Physics : Pccp |
| Sloyan K, Lai CY, Lu JY, et al. (2018) Discerning the Contribution of Morphology and Chemistry in Wettability Studies. The Journal of Physical Chemistry. A |
| Garlisi C, Lai C, George L, et al. (2018) Relating Photoelectrochemistry and Wettability of Sputtered Cu- and N-Doped TiO2 Thin Films via an Integrated Approach The Journal of Physical Chemistry C. 122: 12369-12376 |