Thomas Kämpfe, Ph.D

Affiliations: 
2012-2017 Physics Technische Universität Dresden, Dresden, Sachsen, Germany 
Google:
"Thomas Kämpfe"

Parents

Sign in to add mentor
Lukas M. Eng grad student (Physics Tree)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Lederer M, Abdulazhanov S, Olivo R, et al. (2021) Electric field-induced crystallization of ferroelectric hafnium zirconium oxide. Scientific Reports. 11: 22266
Ali T, Mertens K, Kuehnel K, et al. (2021) A FeFET with a Novel MFMFIS Gate Stack: Towards Energy-Efficient and Ultrafast NVMs for Neuromorphic Computing. Nanotechnology
Lederer M, Kämpfe T, Vogel N, et al. (2020) Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction. Nanomaterials (Basel, Switzerland). 10
Ali T, Kuhnel K, Czernohorsky M, et al. (2020) A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO 2 Memory FeFET: A Temperature-Modulated Operation Ieee Transactions On Electron Devices. 67: 2793-2799
Ali T, Kuhnel K, Czernohorsky M, et al. (2020) A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO 2 Memory FeFET: Pyroelectricity and Reliability Ieee Transactions On Electron Devices. 67: 2981-2987
Mart C, Kämpfe T, Czernohorsky M, et al. (2020) The electrocaloric effect in doped hafnium oxide: Comparison of direct and indirect measurements Applied Physics Letters. 117: 42903
Lehninger D, Olivo R, Ali T, et al. (2020) Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation Physica Status Solidi (a). 217: 1900840
Mart C, Kämpfe T, Hoffmann R, et al. (2020) Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles Advanced Electronic Materials. 6: 1901015
Ali T, Polakowski P, Buttner T, et al. (2019) Theory and Experiment of Antiferroelectric (AFE) Si-Doped Hafnium Oxide (HSO) Enhanced Floating-Gate Memory Ieee Transactions On Electron Devices. 66: 3356-3364
Lederer M, Kämpfe T, Olivo R, et al. (2019) Local crystallographic phase detection and texture mapping in ferroelectric Zr doped HfO2 films by transmission-EBSD Applied Physics Letters. 115: 222902
See more...