☰

Herbert H. Sawin

Affiliations: 
1980 Chemical Engineering University of California, Berkeley, Berkeley, CA, United States 
 1984- Chemical Engineering Massachusetts Institute of Technology, Cambridge, MA, United States 
Google:
"Herbert Sawin"
Tree Publications Similar researchers PubMed Report error

Parents

Sign in to add mentor
Robert P. Merrill grad student 1980 UC Berkeley (Chemistry Tree)
 (A KINETIC STUDY OF HYDRAZINE DECOMPOSITION ON IRIDIUM(111) BY MOLECULAR BEAM SCATTERING AND TEMPERATURE PROGRAMMED DECOMPOSITION)

Children

Sign in to add trainee
Ohseung Kwon grad student MIT
Brian Eric Thompson grad student 1986 MIT
Jane P. Chang grad student 1997 MIT
Heeyeop Chae grad student 2000 MIT
Stacy A Rasgon grad student 1999-2005 MIT

Collaborators

Sign in to add collaborator
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Antonelli GA, Jiang G, Sriram M, et al. (2010) Designing ultra-low-k dielectric materials for ease of patterning Materials Research Society Symposium Proceedings. 1249: 217-222
Guo W, Sawin HH. (2010) Etching of SiO2 in C4F8∕Ar plasmas. II. Simulation of surface roughening and local polymerization Journal of Vacuum Science and Technology. 28: 259-270
Guo W, Sawin HH. (2010) Etching of SiO2 in C4F8∕Ar plasmas. I. Numeric kinetics modeling and Monte Carlo simulation in a three-dimensional profile simulator Journal of Vacuum Science and Technology. 28: 250-258
Guo W, Sawin HH. (2009) Modeling of the angular dependence of plasma etching Journal of Vacuum Science and Technology. 27: 1326-1336
Guo W, Bai B, Sawin HH. (2009) Mixing-layer kinetics model for plasma etching and the cellular realization in three-dimensional profile simulator Journal of Vacuum Science and Technology. 27: 388-403
Guo W, Sawin HH. (2009) Review of profile and roughening simulation in microelectronics plasma etching Journal of Physics D. 42: 194014
Yin Y, Sawin HH. (2008) Angular etching yields of polysilicon and dielectric materials in Cl2∕Ar and fluorocarbon plasmas Journal of Vacuum Science and Technology. 26: 161-173
Yin Y, Sawin HH. (2008) Surface roughening of silicon, thermal silicon dioxide, and low-k dielectric coral films in argon plasma Journal of Vacuum Science and Technology. 26: 151-160
Yin Y, Sawin HH. (2007) Impact of etching kinetics on the roughening of thermal SiO2 and low-k dielectric coral films in fluorocarbon plasmas Journal of Vacuum Science and Technology. 25: 802-811
Kwon O, Sawin HH. (2006) Postsilicon oxide etch cleaning process using integrated ashing and an HF vapor process Journal of the Electrochemical Society. 153
See more...