Scott A. Middlebrooks, Ph.D.

Affiliations: 
2001 University of Wisconsin, Madison, Madison, WI 
Area:
Chemical Engineering
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James B. Rawlings grad student 2001 UW Madison
 (Modelling and control of silicon and germanium thin film chemical vapor deposition.)
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Publications

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Middlebrooks SA, Rawlings JB. (2007) Model predictive control of Si1-xGex thin film chemical-vapor deposition Ieee Transactions On Semiconductor Manufacturing. 20: 114-125
Middlebrooks SA, Rawlings JB. (2006) State estimation approach for determining composition and growth rate of Si1-xGex chemical vapor deposition utilizing real-time ellipsometric measurements. Applied Optics. 45: 7043-55
Middlebrooks SA, Rawlings JB. (2006) State estimation approach for determining composition and growth rate of Si<inf>1-x</inf>Ge<inf>x</inf> chemical vapor deposition utilizing real-time ellipsometric measurements Applied Optics. 45: 7043-7055
Middlebrooks SA. (2003) Optimal Model-Predictive Control of Overlay Lithography Implemented in an ASIC Fab Proceedings of Spie - the International Society For Optical Engineering. 5044: 12-23
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