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Philippe P. de Rouffignac, Ph.D.

Affiliations: 
2006 Harvard University, Cambridge, MA, United States 
Area:
applied mathematics, quantum mechanics, spectroscopy, intermolecular forces, solid state and materials science
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"Philippe de Rouffignac"
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Roy Gerald Gordon grad student 2006 Harvard
 (Atomic layer deposition of rare -earth oxides and aluminum catalyzed silica.)

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Gorelikov D, Sullivan N, De Rouffignac P, et al. (2014) Development of atomic layer deposition-activated microchannel plates for single particle detection at cryogenic temperatures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32
Beaulieu DR, Gorelikov D, Klotzsch H, et al. (2011) Plastic microchannel plates with nano-engineered films Nuclear Instruments and Methods in Physics Research, Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 633: S59-S61
De Rouffignac P, Yousef AP, Kim KH, et al. (2006) ALD of scandium oxide from scandium tris (N, N′ - diisopropylacetamidinate) and water Electrochemical and Solid-State Letters. 9: F45-F48
De Rouffignac P, Gordon RG. (2006) Atomic layer deposition of praseodymium aluminum oxide for electrical applications Chemical Vapor Deposition. 12: 152-157
De Rouffignac P, Park JS, Gordon RG. (2005) Atomic layer deposition of y 2O 3 thin films from yttrium tris(N,N′-diisopropylacetamidinate) and water Chemistry of Materials. 17: 4808-4814
De Rouffignac P, Li Z, Gordon RG. (2004) Sealing porous low-k dielectrics with silica Electrochemical and Solid-State Letters. 7: G306-G308
Lim BS, Rahtu A, De Rouffignac P, et al. (2004) Atomic layer deposition of lanthanum aluminum oxide nano-laminates for electrical applications Applied Physics Letters. 84: 3957-3959
Hausmann DM, De Rouffignac P, Smith A, et al. (2003) Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors Thin Solid Films. 443: 1-4
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