Jangho Shin, Ph.D.
Affiliations: | 2003 | University of Wisconsin, Madison, Madison, WI |
Area:
Electronics and Electrical EngineeringGoogle:
"Jangho Shin"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Franco Cerrina | grad student | 2003 | UW Madison | |
| (Line -edge roughness study of next -generation lithography: Carbon nanotubes application to sub-hundred nanometer pattern metrology.) | ||||
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Publications
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| Ma Y, Shin J, Cerrina F. (2003) Line edge roughness and photoresist percolation development model Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 112-117 |
| Shin J, Ma Y, Cerrina F. (2002) Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2927-2931 |
| Shin J, Ma Y, Cerrina F. (2002) Resist line edge roughness study for next generation lithography: Experiment and modeling 2002 International Microprocesses and Nanotechnology Conference, Mnc 2002. 82-83 |
| Lee KK, Lim DR, Kimerling LC, et al. (2001) Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction. Optics Letters. 26: 1888-90 |
| Shin J, Han G, Ma Y, et al. (2001) Resist line edge roughness and aerial image contrast Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2890-2895 |