Yang-Chun Cheng, Ph.D.
Affiliations: | 2009 | University of Wisconsin, Madison, Madison, WI |
Area:
Materials Science EngineeringGoogle:
"Yang-Chun Cheng"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Franco Cerrina | grad student | 2009 | UW Madison | |
| (Mask fabrication and its applications to extreme ultra-violet diffractive optics.) | ||||
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Marconi MC, Wachulak P, Urbanski L, et al. (2010) Extreme ultraviolet lasers demonstrate new nano-patterning schemes 2010 23rd Annual Meeting of the Ieee Photonics Society, Photinics 2010. 335-336 |
| Urbanski L, Wachulak PW, Isoyan A, et al. (2009) Table Top Schemes for Nano-Patterning with Extreme Ultraviolet Lasers Frontiers in Optics |
| Wang T, Quaglio M, Pirri F, et al. (2009) Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography Proceedings of Spie. 7274 |
| Jiang F, Cheng YC, Isoyan A, et al. (2009) Engineering study of extreme ultraviolet interferometric lithography Journal of Micro/Nanolithography, Mems, and Moems. 8 |
| Isoyan A, Cheng YC, Jiang F, et al. (2008) Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin Proceedings of Spie - the International Society For Optical Engineering. 6921 |
| Ma Y, Cheng YC, Cerrina F, et al. (2007) Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241 |
| Cheng YC, Isoyan A, Wallace J, et al. (2007) Extreme ultraviolet holographic lithography: Initial results Applied Physics Letters. 90 |
| Wallace J, Cheng Y, Isoyan A, et al. (2007) A novel EUV exposure station for nanotechnology studies Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 582: 254-257 |